SEMI P23-0200 SEMI 1993/ 20001 SEMI P23-0200 GUIDELINES FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS These guidelines were technically approved by the Global Mask and Mask Equipment Committee and are the direct responsibility of the Japanese Mask and Mask Equipment Committee/ Current edition approved by the Japanese Regional Standards Committee on September 10/ 1999/ Initially available on SEMI OnLine February 2000/ to be published February 2000/ Originally published in 1993/ previously published in 1996/ NOTE/ These guidelines were rewritten in their entirety in February 2000/ 1 Purpose 1/1 The purpose of this guideline is to propose a test mask to be used for evaluation of the sensitivity of Mask Defect Inspection Systems/ This test mask consists of test chips including programmed pattern defects and reference test chips without programmed defects/ Since the test chip is an assembly of cells/ the test chips are defined in this guideline by cell patterns/ programmed defects in cell patterns/ and the layout of the cells/ Also/ the test mask is defined by defining the test chips arrangement/ Furthermore/ the use of this mask is described/ It is desirable that these test masks and benchmark procedures be used when the sensitivity of a Mask Defect Inspection System is evaluated/ 1/2 Background Different masks have been used by many equipment manufacturers and users in the past/ and sensitivity has been tested by various methods decided independently by each manufacturer and user/ In some cases/ no common measurement methods or sensitivity analysis methods have been agreed upon/ Therefore/ confusion exists concerning the sensitivity comparison of equipment between manufacturers/ the definition for specifications between users and suppliers/ and the definition for specifications between users/ Also/ due to the fact that several problems were found when using the previous guideline in actual manufacturing/ the document has been reviewed and content has been changed throughout/ It was also the goal of this revision/ while considering ease of manufacturing of test masks first/ to fully cover the evaluation of mask defect inspection systems/ 2 Scope 2/1 This guideline defines the content and methods for use of test masks used in the evaluation of mask defect inspection systems/ Although it is possible to use this test mask to evaluate transcription of defects etc// this standard does not attempt to define these processes/ 2/2 This guideline shall be revised when a new effective measurement technology for defect sizing becomes commonly available in the market/ 2/3 This guideline does not purport to address safety issues/ if any/ associated with its use/ It is the responsibility of the users of this guideline to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use/ 3 Referenced Standards 3/1 SEMI Standards SEMI P1 Specificat
郑重声明：
1. 《SEMIP23-0200GUIDELINESFORPROGRAMMEDDEFECTMASKSAND》内容来源于互联网，版权归原著者或相关公司所有。
2. 若《86561825文库网》收录的文本内容侵犯了您的权益或隐私，请立即通知我们删除。
